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ProductIntroduction

Inspection Equipment System For SiC (NOVA-2000) is designed for defect inspection of SiC substrate  wafers and homogeneous epitaxial wafers. It features a dedicated multi-channel optical inspection system and an automatic defect detection and classification algorithm tailored for the diversity of SiC defects.The equipment detects and categorizes defects such as micropipes, stacking faults, triangular defects, step bunching, and more, significantly enhancing SiC quality control and process optimization.

ProductParameters

Inspection Equipment For SiC



Model



NOVA-2000



Wafer Type



SiC Substrate, Epitaxial Wafers



Wafer Size



4 inches, 6 inches, 8 inches



throughput



10WPH (6-inch)



Loading/Unloading



Fully Automated, 2 Loadport, 1 Robot



Operating Temperature



20°C~25°C



Operating Humidity



40%~60%



Cleanroom Class



Class 100 or Higher


Note: We can provide customized instruments of the same type and related testing solutions according to customer requirements.

ProductFeatures
  • Multi-channel Optical inspection System
    1
  • Multi-channel Optical inspection System
    2
  • Multi-channel Optical inspection System
    3
  • Multi-channel Optical inspection System
    4
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